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X-Fab launches 0.18 micron Hall sensor process

June 10, 2009 | | 217800450
Analog/mixed signal foundry X-Fab (Erfurt, Germany) offers a production process for Hall sensors. The process allows customers to integrate these sensors into their chip design.
MUNICH, Germany — Analog/mixed signal foundry X-Fab (Erfurt, Germany) offers a production process for Hall sensors. The process allows customers to integrate these sensors into their chip design.

According to X-Fab, the process is based on the company's existing XH018 low-power CMOS process. It allows customers to combine the sensors with high-voltage circuit elements as well as with non-volatile memories.

Hall sensors measure magnetic fields and are used predominantly in automotive, mechatronics and industrial electronics. Applications include position control, speed detection, contactless switches and angle sensors.

In the case of the X-Fab process, the company claims the small geometries it achieves enable designers to create devices with high magnetic sensitivity with low parasitic effects.

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