InVisage, TSMC, join forces for image sensor attack

June 18, 2015 // By Peter Clarke
InVisage Technologies Inc. (Menlo Park, Calif.), a startup developing quantum-dot based light capture film for image sensors, has opened its first sensor manufacturing facility QFAB3 in Hsinchu Science Park, Taiwan.

InVisage said QuantumFilm technology would be introduced later in 2015 and that it is partnering with foundry TSMC for wafer manufacturing and with VisEra Technologies Co. Ltd. for color filter desposition. With this supply chain InVisage is gearing up for an assault on the image sensor market.

QuantumFilm is a light-sensitive layer of quantum dots that replaces the conventional silicon photodiode in digital camera sensors and provides improved dynamic range, greater performance in low light, and global shutter capabilities. InVisage claims that QFAB3 has process geometries down to 5nm, although this is likely a measurement of film thickness.

Cross-section of QuantumFilm process in which metal-chalcogenide quantum-dot fllm replaces silicon photodiodes. Source: InVisage.

InVisage raised $32.5 million in a funding round announced in December 2014. This took the amount raised by InVisage to more than $130 million. Investors in the round included China Oceanwide USA Holdings, as well as GGV Capital, Nokia Growth Partners, RockPort Capital, InterWest Partners, Intel Capital and OnPoint Technologies.

Next: TSMC in the loop